Magnetic thin films sputtering





Magnetic thin films production by DC/RF sputtering.
Working in high vacuum with loadlock insert.
Different 3'' targets are available: The rotating head allows the controlled motion of the substrate above different targets.
Among the motivations behind our work:
Alessandro Magni

IEN Galileo Ferraris
S. delle Cacce 91
10135 Torino (ITALIA)
Fax (39)11-3919834 Tel (39)11-3919821
Italy